Synthesis and Structure of Trisilane and Tetrasilane Containing Pentacoordinate Moieties at Internal Silicon Atoms.
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Accession number;99A0308697
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| Title;Synthesis and Structure of Trisilane and Tetrasilane Containing Pentacoordinate Moieties at Internal Silicon Atoms. |
| Author;
HATANAKA Y
(National Inst. Materials And Chemical Res., Ibaraki, Jpn)
EL-SAYED I
(National Inst. Materials And Chemical Res., Ibaraki, Jpn)
SHIMADA S
(National Inst. Materials And Chemical Res., Ibaraki, Jpn)
TANAKA M
(National Inst. Materials And Chemical Res., Ibaraki, Jpn)
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Journal Title;Abstr Symp Organomet Chem Jpn
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Journal Code:L0853A
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ISSN:
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VOL.45th;NO.;PAGE.8-9(1998)
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| Figure&Table&Reference; |
| Pub. Country;Japan |
| Language;English |
| Abstract;Synthesis, X-ray structure, and electonic properties of oligosilanes containing pentacoordinate moieties at the internal silicon atom are reported. The reaction of N-methyl-N-trimethylsilyl acetamide with Me3Si[ClSi(CH2Cl)]nSiMe3(n=1,2) gave pentacoordinate trisilane 3 or tetrasilane 4 in a high yield. The X-ray analysis revealed almost undistorted trigonal bipyramidal structure of these silicates. The UV spectra of 3 exhibited remarkable red-shift of the .LAMBDA.max(227nm) compared to a series of tetraccordinate trisilanes, while that of 4 appeared at 207nm. (author abst.) |
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