Photosensitivity due to Afloqualone.

Accession number;99A0220565
Title;Photosensitivity due to Afloqualone.
Author; TAKAHAMA HIDETO (Kanagawaken Koseiren Sagamihara Kyodo Hospital) NOTO SHIGEMITSU (Kanagawaken Koseiren Sagamihara Kyodo Hospital)
Journal Title;Rinsho Derma (Tokyo)
Journal Code:Z0122B
ISSN:0018-1404
VOL.41;NO.1;PAGE.66-67(1999)
Figure&Table&Reference;FIG.2, REF.5
Pub. Country;Japan
Language;Japanese
Abstract;