|
Accession number;99A0562719
|
| Title;Sample Preparation for Observation with High Resolution Scanning Electron Microscope (HRSEM) by Ion-beam Sputter Coating. |
| Author;
TAKIZAWA SHIGERU
(Univ. of Tsukuba, Inst. of Geosci.)
ONO YOSHIKI
(Univ. of Tsukuba)
|
Journal Title;Journal of the Mineralogical Society of Japan
|
Journal Code:G0124A
|
ISSN:0454-1146
|
|
VOL.28;NO.2;PAGE.65-69(1999)
|
| Figure&Table&Reference;FIG.3, REF.9 |
| Pub. Country;Japan |
| Language;Japanese |
| Abstract;Ion-beam sputtering deposition is very useful to a nonconductive specimen-preparation technique for ultra-high to high resolution electron microscopy. Application of the sputtering has modified the ion-beam thinning apparatus for preparation of the sample for TEM. Effective use of our modified sputtering apparatus leads to a good conductivity of the Pt-coating composed of finer particles in 1.7nm diamerter, and a surface of crystal can be closely observed under magnification of more than 100,000. (author abst.) |
|
|
|
Related Articles;
|
|
