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Accession number;99A0711844
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| Title;Preparation and characterization of fluoride thin films by liquid precursor method using trifluoroacetic acid. |
| Author;
TADA MUNEHIRO
(Keio Univ., Fac. of Sci. and Technol.)
FUJIHARA SHINOBU
(Keio Univ., Fac. of Sci. and Technol.)
KIMURA TOSHIO
(Keio Univ., Fac. of Sci. and Technol.)
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Journal Title;Fusso Kagaku Toronkai Koen Yoshishu
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Journal Code:F0135B
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ISSN:
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VOL.22nd;NO.;PAGE.68-69(1998)
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| Figure&Table&Reference; |
| Pub. Country;Japan |
| Language;Japanese |
| Abstract;Fluoride thin films were prepared by a liquid precursor method using trifluoroacetic acid. The phase and morphology of the films depended on the heat-treatment temperature. The refractive index of the films could be greatly varied by the preparation conditions. The formation of the fluoride results from the decomposition of the metal trifluoroacetate by firing the precursor films. Whether the fluorides are formed or not was evaluated by the Pauling electronegativity of metal elements. (author abst.) |
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