Preparation and characterization of sp2-type carbon thin filmes by acetylene and NF3 plasma.
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Accession number;99A0711856
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| Title;Preparation and characterization of sp2-type carbon thin filmes by acetylene and NF3 plasma. |
| Author;
FUKUTSUKA TOMOKAZU
(Kyoto Univ., Grad. Sch.)
ABE TAKESHI
(Kyoto Univ., Grad. Sch.)
INABA MINORU
(Kyoto Univ., Grad. Sch.)
OGUMI ZEMPACHI
(Kyoto Univ., Grad. Sch.)
TASAKA AKIMASA
(Doshisha Univ., Fac. of Eng.)
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Journal Title;Fusso Kagaku Toronkai Koen Yoshishu
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Journal Code:F0135B
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ISSN:
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VOL.22nd;NO.;PAGE.94-95(1998)
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| Figure&Table&Reference; |
| Pub. Country;Japan |
| Language;Japanese |
| Abstract;Carbon thin films were prepared from acetylene (source of carbon thin film), nitrogen tetrafluoride (NF3) and argon (as plasma assist gas) by use of glow discharge plasma, which was generated by a radio frequency power supply at 13.56 MHz. Ni plate was used as substrate whose temperature was kept at 873 K. The resultant carbon thin films were characterized by Raman spectroscopy, Auger electron spectroscopy and TEM. The Raman spectra revealed that crystallinity of the carbon thin films was found to increase with increasing the flow rate of NF3. From the peak position of Auger spectra, it was revealed that the carbon films do not contain nitrogen and fluorine atoms, indicating that NF3 served only as agents removing hydrogen from acetylene. From the peak shapes, it was revealed that the carbon thin films consist of sp2-type carbon. In the TEM images, a graphitizable lamellar structures were obtained. (author abst.) |
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