Direct thermal fluorination of DLC surface.
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Accession number;99A0711857
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| Title;Direct thermal fluorination of DLC surface. |
| Author;
HATTORI YOSHIYUKI
(Shinshu Univ., Text. Sci. and Technol.)
KOBAYASHI KEITA
(Shinshu Univ., Text. Sci. and Technol.)
KAWASAKI SHINJI
(Shinshu Univ., Text. Sci. and Technol.)
OKINO FUJIO
(Shinshu Univ., Text. Sci. and Technol.)
TOHARA HIDEKAZU
(Shinshu Univ., Text. Sci. and Technol.)
YANAGIUCHI KATSUAKI
(TDK Corp., Res. & Dev. Cent.)
TSUYOSHI ATSUHIRO
(TDK Corp., Res. & Dev. Cent.)
NAKAYAMA MASATOSHI
(TDK Corp., Res. & Dev. Cent.)
NAKAJIMA KAORU
(Kyoto Univ., Grad. Sch.)
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Journal Title;Fusso Kagaku Toronkai Koen Yoshishu
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Journal Code:F0135B
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ISSN:
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VOL.22nd;NO.;PAGE.96-97(1998)
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| Figure&Table&Reference; |
| Pub. Country;Japan |
| Language;Japanese |
| Abstract;Direct fluorination of DLC surface has been performed by thermal reaction (25 - 100 .DEG.C.) in elemental fluorine. The surface-fluorinated DLC films have been characterized by means of Raman, Rutherford backscattering (RBS) and XPS. The surfaces of DLC films fluorine:carbon atomic ratio (F/C) decreased from 0.70 to 0.26, when fluorination temperature increased 20 to 100 .DEG.C.. The Raman spectra of fluorinated films agree well with those of as-deposited film, suggesting that DLC films retain their structural properties in the bulk even after fluorination. The information on the depth profile of elements in the films was obtained by RBS of 350 keV He+ ion. The result indicates that fluorine atoms exist in the specific regions of about 1.5 nm in depth and that the amount of attached fluorine decreases with increasing reaction time. (author abst.) |
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