The Effect of an Electrode in Plasma Chamber of RIKEN 18GHz ECRIS(Electron Cyclotron Resonance Ion Source).
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Accession number;99A1045372
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| Title;The Effect of an Electrode in Plasma Chamber of RIKEN 18GHz ECRIS(Electron Cyclotron Resonance Ion Source). |
| Author;
HIGURASHI Y
(Rikkyo Univ., Toshimaku, Jpn)
NAKAGAWA T
(Inst. Physical And Chemical Res.(riken), Saitama, Jpn)
KIDERA M
(Inst. Physical And Chemical Res.(riken), Saitama, Jpn)
MIYAZAWA Y
(Inst. Physical And Chemical Res.(riken), Saitama, Jpn)
HEMMI M
(Inst. Physical And Chemical Res.(riken), Saitama, Jpn)
CHIBA T
(Inst. Physical And Chemical Res.(riken), Saitama, Jpn)
KASE M
(Inst. Physical And Chemical Res.(riken), Saitama, Jpn)
KAGEYAMA T
(Inst. Physical And Chemical Res.(riken), Saitama, Jpn)
YANO Y
(Inst. Physical And Chemical Res.(riken), Saitama, Jpn)
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Journal Title;Proc Symp Accel Sci Technol
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Journal Code:F0512B
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ISSN:0914-2789
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VOL.12th;NO.;PAGE.19-21(1999)
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| Figure&Table&Reference;FIG.6, REF.11 |
| Pub. Country;Japan |
| Language;English |
| Abstract;We observed the enhancement of the Xe20+ beam intensity from the RIKEN 18GHz electron cyclotron resonance ion source(ECRIS) when using the electrode which was installed in plasma chamber of ion source. In order to study the effect of electrode to ECR plasma, We measured high energetic bremsstrahlung X-ray and beam intensity of Xe20+ when changing electrode position and supplied bias voltage. We observed that yield and slope of high energetic X-ray spectra and beam intensity of charged ions are strongly dependent on the negative bias voltage of electrode and its position. (author abst.) |
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