Construction of Plasma Micro-Undulator by Laser Interference and Resonant Photoionization.
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Accession number;99A1045403
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| Title;Construction of Plasma Micro-Undulator by Laser Interference and Resonant Photoionization. |
| Author;
KOBAYASHI N
(Toshiba Corp., Yokohama)
SUZUKI Y
(Toshiba Corp., Yokohama)
HASHIMOTO K
(Toshiba Corp., Yokohama)
AOKI N
(Toshiba Corp., Yokohama)
KIMURA H
(Toshiba Corp., Yokohama)
KONAGAI C
(Toshiba Corp., Yokohama)
NAKAGAWA S
(Toshiba Corp., Yokohama)
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Journal Title;Proc Symp Accel Sci Technol
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Journal Code:F0512B
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ISSN:0914-2789
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VOL.12th;NO.;PAGE.110-112(1999)
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| Figure&Table&Reference;FIG.8, REF.4 |
| Pub. Country;Japan |
| Language;English |
| Abstract;An electrostatic plasma micro-undulator was formed experimentally using a combination of laser interference and resonant photoionization techniques. Plasma micro-undulator of this type are expected to be applied as compact and short-wavelength insertion devices. Stable microscopic interference fringes were obtained using a prism as an optical device for interference, and atomic vapor was resonantly ionized by this interfered laser beam. As a result, an emission from plasma corresponding to interference fringes, with periodic length of about 300.MU.m, was obsderved. Thus, formation of a plasma micro-undulator was demonstrated by these techniques. (author abst.) |
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