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Accession number;01A0903178
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| Title;Investigation on Surfaces and Firing Processes of HfO2 Films by Thermal Desorption Spectroscopy. |
| Author;
ADACHI KIN'YA
(Nihon Univ., Coll. of Eng.)
NISHIDE TOSHIKAZU
(Nihon Univ., Coll. of Eng.)
MIYABAYASHI NOBUYOSHI
(Denshikagaku)
SANO MAKIKO
(Denshikagaku)
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Journal Title;Netsu Sokutei Toronkai Koen Yoshishu
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Journal Code:F0840B
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ISSN:
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VOL.36th;NO.;PAGE.90-91(2000)
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| Figure&Table&Reference;FIG.2 |
| Pub. Country;Japan |
| Language;Japanese |
| Abstract;Firing processes of hafnia gel films were investigated by thermal desorption spectroscopy(TDS) and X-ray photoelectron spectroscopy(XPS). Hafnia gel films were prepared by sol-gel processes using HfCl4 as a starting material and using a mixture of H216O and H218O for hydrolysis. The gel films were fired in the TDS equipment. By the analysis of the TDS spectra, the adsorbed H2O was evolved under 100.DEG.C. and H2O contained in the gel was evolved under 200.DEG.C.. Oxygen in the gel films was evolved under 600.DEG.C. in four temperature ranges of 100-200.DEG.C., 200-300.DEG.C., 400-480.DEG.C. and 480-650.DEG.C.. The XPS analysis of the hafnia gel films and the fired films revealed that atomic ratio of O to Hf is three to one in the gel films and two to one in the fired ones, which corresponds with the evolution of the oxygen in the gel films during the firing. (author abst.) |
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