Modeling of Si Cluster Growth and Transportation during Thermal Plasma Deposition Process.

Accession number;02A0383357
Title;Modeling of Si Cluster Growth and Transportation during Thermal Plasma Deposition Process.
Author; HAN P (Univ. Tokyo) YOSHIDA T (Univ. Tokyo)
Journal Title;Abstracts. Meeting of JIM
Journal Code:S0988A
ISSN:1342-5730
VOL.130th;NO.;PAGE.281(2002)
Figure&Table&Reference;FIG.1
Pub. Country;Japan
Language;English
Abstract;
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