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Accession number;02A0418865
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| Title;Chemistry of Stable Silicon Center Radical. Isolation, Structure, and Properties of Tris(triisopropylsilyl)silyl Radical. |
| Author;
TOMITA DAISUKE
(Gunma Univ.)
TANAKA RYOJI
(Gunma Univ.)
KYUSHIN SOICHIRO
(Gunma Univ.)
MATSUMOTO HIDEYUKI
(Gunma Univ.)
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Journal Title;Nippon Kagakkai Koen Yokoshu
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Journal Code:S0493A
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ISSN:0285-7626
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VOL.81st;NO.1;PAGE.5(2002)
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| Figure&Table&Reference;FIG.1, REF.3 |
| Pub. Country;Japan |
| Language;Japanese |
| Abstract;The yellow crystals of tris(triisopropylsilyl)silyl radical were obtained by the one-electron reduction of chlorotris(triisopropylsilyl)silane by sodium. The X-ray crystallographic analysis shows that the silyl radical center has the planar structure and that the silyl radical is a typical free radical without the interaction among the silyl radical centers. (author abst.) |
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