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Accession number;02A0421423
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| Title;Time-resolved absorption spectroscopy using soft x-rays generated from femtosecond laser pulses. |
| Author;
NAKANO HIDETOSHI
(Ntt Busseikisoken)
NISHIKAWA TADASHI
(Ntt Busseikisoken)
OGURI KATSUYA
(Ntt Busseikisoken)
SUESUGI NAO
(Tohoku Inst. of Technol.)
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Journal Title;Nippon Kagakkai Koen Yokoshu
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Journal Code:S0493A
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ISSN:0285-7626
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VOL.81st;NO.1;PAGE.A.20(2002)
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| Figure&Table&Reference; |
| Pub. Country;Japan |
| Language;Japanese |
| Abstract;High-density plasmas created near a solid surface by a femtosecond laser pulse emit ultrashort x-ray pulses that are synchronized with the laser pulse. We achieved more than 30-fold enhancement of the soft x-ray emission by fabricating an array of nanoholes on an alumina surface. We measured the duration of the soft x-ray emitted from the laser plasma by the cross-correlation method using an optical field-induced ionization process in Kr gas. Utilizing a 10-ps soft x-ray pulse, we measured the time-resolved absorption of optically excited silicon near its LII,III edge. We found that laser-pulse irradiation caused a more than 10% increase in the soft x-ray absorption near the edge, which recovered within 20ps. We assume the origin of this absorption change to be the bandgap renormalization of Si. We also employed picosecond soft x-rays to measure the ablated particles in Al plasma created by a 100-fs laser pulse. (author abst.) |
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