Fluorocarbon Semiconductor Exhaust Gas Abatement With Using the Atmospheric Pressure Glow Plasma.
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Accession number;02A0620424
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| Title;Fluorocarbon Semiconductor Exhaust Gas Abatement With Using the Atmospheric Pressure Glow Plasma. |
| Author;
KOGOMA M
(Fac. Sci. And Technol., Dep. Chemistry, Tokyo, Jpn)
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Journal Title;Fusso Kagaku Toronkai Koen Yoshishu
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Journal Code:F0135B
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ISSN:
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VOL.25th;NO.;PAGE.68-69(2001)
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| Figure&Table&Reference; |
| Pub. Country;Japan |
| Language;English |
| Abstract;Per-fluorinated compounds (PFCs) and hydrofluorinated compounds (HFCs) such as CF4, C2F6, NF3 and CHF3 are commonly used in the semiconductor fabrication industry.But they have been identified as potential global warming gases. For example, CF4 has a life time of longer than 50,000 years in an ambience and it's global warming potential (GWP) is about 6,500 times higher than that of CO2. For most PFCs and HFCs,the conventional scrubbing systems that used the large combustion reactors have been used to achieve the abatement of their compounds. However, such combustion system is insufficient to eliminate all of the fluorinated compounds and needs great running cost.We will propose a new atmospheric pressure glow plasma abatement system as the post-dry pump apparatus. (author abst.) |
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