Thermoelectric properties of SiC thick films deposited by thermal plasma PVD.

Accession number;03A0279737
Title;Thermoelectric properties of SiC thick films deposited by thermal plasma PVD.
Author; WANG X H (Univ. Tokyo) YAMAMOTO A (National Inst. Advanced Industrial Sci. And Technol.) EGUCHI K (Univ. Tokyo) OBARA H (National Inst. Advanced Industrial Sci. And Technol.) YOSHIDA T (Univ. Tokyo)
Journal Title;Abstracts. Meeting of JIM
Journal Code:S0988A
ISSN:1342-5730
VOL.132nd;NO.;PAGE.337(2003)
Figure&Table&Reference;FIG.1
Pub. Country;Japan
Language;English
Abstract;
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