Simulation of Anisotropic Chemical Etching of Single Crystalline Silicon using Cellular-Automata
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Accession number;04A0045909
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| Title;Simulation of Anisotropic Chemical Etching of Single Crystalline Silicon using Cellular-Automata |
| Author;
KAKINAGA T
(Ritsumeikan Univ., Shiga, Jpn)
TABATA O
(Ritsumeikan Univ., Shiga, Jpn)
BABA N
(Ritsumeikan Univ., Shiga, Jpn)
ISONO Y
(Ritsumeikan Univ., Shiga, Jpn)
KORVINK J G
(Univ. Freiburg, Freiburg, Deu)
EHRMANN K H
(Univ. Freiburg, Freiburg, Deu)
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Journal Title;Transactions of the Institute of Electrical Engineering of Japan. E
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Journal Code:L3098A
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ISSN:1341-8939
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VOL.124;NO.1;PAGE.7-13(2004)
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| Figure&Table&Reference;FIG.15, TBL.1, REF.13 |
| Pub. Country;Japan |
| Language;English |
| Abstract; |
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