Arrayed AFM Probes for Parallel Lithography
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Accession number;04A0505566
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| Title;Arrayed AFM Probes for Parallel Lithography |
| Author;
KAKUSHIMA KUNIYUKI
(Univ. Tokyo, Inst. Ind. Sci., JPN)
WATANABE TOSHIYUKI
(Ritsumeikan Univ., Fac. of Sci. and Eng.)
SHIMAMOTO KOJI
(Ritsumeikan Univ., Fac. of Sci. and Eng.)
GODA TAKUSHI
(Kagawa Univ., Faculty of Engineering, JPN)
ATAKA MANABU
(Univ. Tokyo, Inst. Ind. Sci., JPN)
MIMURA HIDENORI
(Res. Inst. Electrical Communication, Tohoku Univ., JPN)
ISONO YOSHIMASA
(Ritsumeikan Univ., Fac. of Sci. and Eng.)
HASHIGUCHI GEN
(Kagawa Univ., Faculty of Engineering, JPN)
MIHARA YUTAKA
(Kagawa Univ., Faculty of Engineering, JPN)
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Journal Title;Transactions of the Institute of Electrical Engineering of Japan. E
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Journal Code:L3098A
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ISSN:1341-8939
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VOL.124;NO.7;PAGE.248-254(2004)
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| Figure&Table&Reference;FIG.11, REF.15 |
| Pub. Country;Japan |
| Language;Japanese |
| Abstract;AFM ( atomic force microscope ) probe array with the multiple probe was manufactured in order to parallel scan the lithography by electric field support oxidation using the scanning probe. The probe array for the lithography were differently built in the probe for the reference. Therefore, it has the advantage by the use of existing AFM equipment as it is alignment and observation after the lithography. The method of parallel SPL ( Scanning Probe Lith ography ) was proposed, while only the reference probe is monitored, and it was shown experimentally as parallel SPL by 4 probes of a ODS-SAM film. |
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