Science Links Japan | Three Dimensional Micro Fabrication of Photoresist and Resin Materials by Using Gray-scale Lithography and Molding

Three Dimensional Micro Fabrication of Photoresist and Resin Materials by Using Gray-scale Lithography and Molding

Accession number;04A0719593

Title;Three Dimensional Micro Fabrication of Photoresist and Resin Materials by Using Gray-scale Lithography and Molding

Author; MORI RYOTARO (Keio Univ., Faculty of Sci. and Technol., JPN) HANAI KEI (Keio Univ., Faculty of Sci. and Technol., JPN) MATSUMOTO YOSHINORI (Keio Univ., Faculty of Sci. and Technol., JPN)

Journal Title;Transactions of the Institute of Electrical Engineering of Japan. E

Journal Code:L3098A

ISSN:1341-8939

VOL.124;NO.10;PAGE.359-363(2004)

Figure&Table&Reference;FIG.7, REF.9

Pub. Country;Japan

Language;Japanese

Abstract;Gray scale lithography to the SU-8 resist was tried by using emulsion gray scale mask and general-purpose mask analyzer. A thin glass substrate was plastered over with SU-8 resist and the ultraviolet light was by irradiated through the back side of the glass substrate. It was possible to form three-dimensional microstructure body of 400.MU.m maximum height in the good adhesion to the glass substrate. The surface roughness of the structure arose by the intensity irregularity on the mask pattern in reducing ink dot pattern on molding, and it confirmed that the surface roughness could be reduced by averaging the intensity irregularity of the dot on the mask.

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