Interface Control between Pentacene Film and Si(001) by Chemisorbed Buffer Monolayer

Accession number;05A0303240
Title;Interface Control between Pentacene Film and Si(001) by Chemisorbed Buffer Monolayer
Author; WAKATSUCHI M (Riken (inst. Of Physical And Chemical Res.), Saitama, Jpn) KATO H S (Riken (inst. Of Physical And Chemical Res.), Saitama, Jpn) YAMADA T (Riken (inst. Of Physical And Chemical Res.), Saitama, Jpn) KAWAI M (Riken (inst. Of Physical And Chemical Res.), Saitama, Jpn)
Journal Title;Jpn J Appl Phys Part 1
Journal Code:G0520B
ISSN:0021-4922
VOL.44;NO.1B;PAGE.514-518(2005)
Figure&Table&Reference;FIG.4, TBL.1, REF.25
Pub. Country;Japan
Language;English
Abstract;Pentacene films were fabricated by molecular beam deposition on two silicon (Si) substrates. One of the substrates was Si(001) with a chemisorbed 1,4-cyclohexadiene surfactant buffer and the other was Si(001) with a SiO2 oxide layer. The 1,4-cyclohexadiene buffered surface was characterized by high-resolution electron energy loss spectroscopy (HREELS). 1,4-cyclohexadiene molecules were adsorbed on the clean Si(001) (2*1) substrate forming Si-C covalent bonds at 300 K and a well-ordered (2*1) structure was preserved even after adsorption of the molecules. The chemisorbed 1,4-cyclohexadiene layer is thermally stable at approximately room temperature. The morphology and crystallinity of the pentacene films were investigated by atomic force microscopy (AFM) and X-ray diffraction (XRD) analysis, respectively. The AFM images showed larger grains exceeding 1 .MU.m for the pentacene film deposited on the Si(001) substrate with 1,4-cyclohexadiene buffer, whereas the small grains of 200 nm on average were observed for the film on Si(001) with SiO2 under the same deposition rate and substrate temperature. (author abst.)
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