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Accession number;05A0303275
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| Title;Unbalanced Magnetron Sputtering Using Cylindrical Target for Low-Temperature Optical Coating |
| Author;
WANG C-S
(Kanazawa Univ., Kanazawa, Jpn)
SASAKI K
(Kanazawa Univ., Kanazawa, Jpn)
YONEZAWA Y
(Electricity/information Sci. Industrial Res. Inst. Of Ishikawa, Kanazawa, Jpn)
HATA T
(Kanazawa Univ., Kanazawa, Jpn)
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Journal Title;Jpn J Appl Phys Part 1
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Journal Code:G0520B
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ISSN:0021-4922
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VOL.44;NO.1B;PAGE.669-672(2005)
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| Figure&Table&Reference;FIG.8, REF.12 |
| Pub. Country;Japan |
| Language;English |
| Abstract;A new optical coating technology was developed for the first time using unbalanced magnetron sputtering combined with a cylindrical target. A significant reduction of ignition and glow discharge voltages were observed by adding magnets to carry out the unbalanced magnetron sputtering. A high deposition rate of 30 nm/min was realized for TiO2 film preparation; this rate was approximately 3 times larger than that obtained by conventional magnetron sputtering. Moreover, deposition power efficiency twice as large as that obtained by conventional magnetron sputtering was realized. A fine-grain structure was observed and a large refraction index of 2.65 was obtained. (author abst.) |
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