Growth Process of the .BETA.-FeSi2 epitaxial film on Si(111) by MBE
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Accession number;05A0393877
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| Title;Growth Process of the .BETA.-FeSi2 epitaxial film on Si(111) by MBE |
| Author;
JI S.Y.
(Tohoku Univ., Sendai, Jpn)
WANG J.F.
(Tohoku Univ., Sendai, Jpn)
LIM J.
(Tohoku Univ., Sendai, Jpn)
ABE S.
(Res. Inst. Electric And Magnetic Materials, Sendai, Jpn)
OGINO H.
(Tohoku Univ., Sendai, Jpn)
MIMURA K.
(Tohoku Univ., Sendai, Jpn)
ISSHIKI M.
(Tohoku Univ., Sendai, Jpn)
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Journal Title;Abstracts. Meeting of JIM
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Journal Code:S0988A
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ISSN:1342-5730
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VOL.136th;NO.;PAGE.213(2005)
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| Figure&Table&Reference;FIG.1 |
| Pub. Country;Japan |
| Language;English |
| Abstract; |
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