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Accession number;05A0758476
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| Title;Low-temperature Sputtering Unit and Application to DLC Coating |
| Author;
SUGAI KEN'ICHI
(Nachi-Fujikoshi Corp.)
MATSUNAMI KOJI
(Nachi-Fujikoshi Corp.)
HASHIMOTO TAKANOBU
(Nachi-Fujikoshi Corp.)
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Journal Title;Nachi Bus News
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Journal Code:F0439A
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ISSN:
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VOL.8;NO.A1-D1;PAGE.B2.1(1),B2.1-B2.7(2005)
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| Figure&Table&Reference;FIG.11, TBL.2, REF.3 |
| Pub. Country;Japan |
| Language;Japanese |
| Abstract;Nachi developed and marketed a new sputtering unit that enables the DLC film formation on all-purpose structural materials under low temperature. The unit is equipped with two pairs of obliquely-facing targets, meaning that two rectangular targets are facing each other obliquely, and electromagnets around the circumferences of these targets, enabling film formation faster than the conventional systems and low-temperature processing of 180.DEG.C. or lower. The cylindrical chamber of 600mm in diameter and 900mm in height enables the processing of large materials as well as the mass processing of small materials. Introduced here are our new sputtering unit and the characteristics of DLC film formed at low temperature with this unit. (author abst.) |
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