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Accession number;06A0543050
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| Title;A study of susceptibility to ultraviolet light after chemical peeling using glycolic acid |
| Author;
HARIYA TAKESHI
(Shiseido Co., Ltd., JPN)
YANAI MOTOHIRO
(Shiseido Co., Ltd., JPN)
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Journal Title;Aesthetic Dermatol
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Journal Code:L5200A
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ISSN:1341-5530
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VOL.16;NO.2;PAGE.88-94(2006)
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| Figure&Table&Reference;FIG.4, REF.8 |
| Pub. Country;Japan |
| Language;Japanese |
| Abstract;Recently, chemical peeling (CP) using glycolic acid (GA) has become widely accepted as a dermatological treatment for certain cutaneous diseases. Generally, it is believed that sun protection after CP is necessary to protect against photodamage of the skin. Many reports have mentioned that the daily application of cosmetic products containing glycolic acid could increase the sensitivity of skin to UV light; however, the enhancement of susceptibility to UV light by superficial CP treatment using high-dose/low-pH GA remains unclear. In this report, we observed that experimental applications of high-dose/low-pH GA mimicked superficial CP using GA-induced enhancement of susceptibility to UV light without significant changes of skin physiological parameters. Therefore, it is suggested that sun care procedures such as the use of non-chemical and hypoirritation sunscreen products are necessary after CP by a physician. (author abst.) |
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