Moving Mask Direct Photo-Etching (M'2'DPE) for 3D Micromachining of Polytetrafluoroethylene
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Accession number;06A0665342
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| Title;Moving Mask Direct Photo-Etching (M'2'DPE) for 3D Micromachining of Polytetrafluoroethylene |
| Author;
NAKAMURA YUSHI
(Matsushita Electric Works, Ltd., Mie, Jpn)
TABATA OSAMU
(Kyoto Univ., Kyoto, Jpn)
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Journal Title;Transactions of the Institute of Electrical Engineering of Japan. E
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Journal Code:L3098A
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ISSN:1341-8939
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VOL.126;NO.9;PAGE.499-503(2006)
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| Figure&Table&Reference;FIG.12, REF.4 |
| Pub. Country;Japan |
| Language;English |
| Abstract;Polytetrafluoroethylene (PTFE) is known as one of the important materials by its outstanding properties. Therefore, application of PTFE to MEMS has been strongly desired to enhance the possibility of the MEMS. Recently, a microfabrication of PTFE by irradiation of synchrotron radiation (SR) light has been demonstrated. Althogh, it was impossible to realize 3D microstructure with free arbitrary shaped walls. To meet this demand, we applied moving mask technique to direct photo-etching of PTFE. In this technique, X-ray mask is moved during exposure, and yield energy distribution in the resist, which realize 3D microstructure with free arbitrary shaped sidewall. In this paper, recent result on this technique are described. We carried out the experiment using beam at the AURORA facility, and fabricated conical microstructure. It showed the possibility of flexible 3D microfabrication of PTFE. This microfabrication technology is greatly expected to be applied for the MEMS or bio-MEMS by PTFE's outstanding properties. |
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