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Accession number;07A0043217
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| Title;Development of a high speed laser flash system using a sub-nanosecond thermoreflectance technique (2) |
| Author;
YAGI TAKASHI
(National Inst. Advanced Industrial Sci. and Technol., JPN)
NAKAMURA FUMISHIGE
(National Inst. Advanced Industrial Sci. and Technol., JPN)
TAKETOSHI NAOYUKI
(National Inst. Advanced Industrial Sci. and Technol., JPN)
KATO HIDEYUKI
(National Inst. Advanced Industrial Sci. and Technol., JPN)
BABA TETSUYA
(National Inst. Advanced Industrial Sci. and Technol., JPN)
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Journal Title;Thermophys Prop
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Journal Code:X0031A
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ISSN:0911-1743
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VOL.27th;NO.;PAGE.45-47(2006)
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| Figure&Table&Reference;FIG.6, REF.8 |
| Pub. Country;Japan |
| Language;Japanese |
| Abstract;Thermophysical property of thin film is one of the parameters needed to predict the performance of electronic devices. National Metrology Institute of Japan (NMIJ, AIST) has started to provide a national standard of thin film thermal diffusion time from 100ps to 6500ps using a picosecond thermoreflectance method. The picosecond thermoreflectnace method is based upon rear heating/front detection type (R-F type) thermoreflectance technique, which is essentially same as the laser flash method. Based on principles of the RF type thermoreflectance techinque, NMIJ has developed a high speed laser flash system in order to extend observable time scale such as a range from 10ns to 1.MU.s. The performance of the high speed laser flash system was estimated. In regard to pump laser and probe laser, the peak to peak jitter of both lasers is below 100ps, which is much smaller than the values of full width of half maximum of laser pulse of 1ns (pump laser). The stability test was carried out during 10 days in terms of a half time of a 210nm titanium nitride (TiN) thin film, resulting in 100ps of scatter for the half time. The development of a thin film reference material for thermal diffusivity has been reported. (author abst.) |
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