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Accession number;07A0043218
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| Title;Development of thermophysical property measurement system using a femtosecond pulse laser (2) |
| Author;
NAKAMURA FUMISHIGE
(National Inst. Advanced Industrial Sci. and Technol., JPN)
YAGI TAKASHI
(National Inst. Advanced Industrial Sci. and Technol., JPN)
TAKETOSHI NAOYUKI
(National Inst. Advanced Industrial Sci. and Technol., JPN)
KATO HIDEYUKI
(National Inst. Advanced Industrial Sci. and Technol., JPN)
BABA TETSUYA
(National Inst. Advanced Industrial Sci. and Technol., JPN)
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Journal Title;Thermophys Prop
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Journal Code:X0031A
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ISSN:0911-1743
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VOL.27th;NO.;PAGE.48-50(2006)
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| Figure&Table&Reference;FIG.6, REF.5 |
| Pub. Country;Japan |
| Language;Japanese |
| Abstract;A thermophysical property measurement system using a femotosecond themoreflectance technique has been developed in the National Metrology Institute of Japan in order to observe thermal energy transport phenomena faster than 100ps. We succeed in measuring the thermal diffusivity of Mo metallic thin film with 100nm thickness and presented these results in our previous report. The developed system has been also focused on measuring a small area (less than 1.MU.m) of themophysical properties. In this study, we carried out one dimensional mapping of thermoreflectance signal of thin film using the femtosecond thermoreflectance system in order to estimate the point resolution of this developed system. The specimen was Mo thin film with 150nm and 200nm thicknesses (Fig. 2) and the thermoreflectance signal was measured at regular intervals of 20.MU.m and 1.MU.m near the step between 150nm and 200nm thickness area (Fig. 3). The thermoreflectance signal measurement clearly distinguish the difference of film thickness (Fig. 4, 5) and the resolution of the developed femtosecond thermoreflectance method was estimated to be 1.MU.m (Fig. 6). (author abst.) |
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